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薄膜材料與技術(shù)導(dǎo)論 版權(quán)信息
- ISBN：9787567235793
- 條形碼：9787567235793 ; 978-7-5672-3579-3
- 裝幀：一般膠版紙
- 冊數(shù)：暫無
- 重量：暫無
- 所屬分類：>
薄膜材料與技術(shù)導(dǎo)論 內(nèi)容簡介
本書較全面地介紹了有關(guān)薄膜材料制備技術(shù)的基礎(chǔ)知識，總結(jié)了近年來薄膜材料制備領(lǐng)域的新進(jìn)展，并融入了編著者多年來從事薄膜材料研究中所取得的成果。在**章中，主要介紹了薄膜材料的基本概念、特征，并扼要介紹了薄膜材料的物性和結(jié)構(gòu)的分析方法。第二章和第三章講述重要的預(yù)備知識，即真空技術(shù)和等離子體技術(shù)。第四、第五章著重討論了制備薄膜材料的物理氣相沉積技術(shù)和化學(xué)氣相沉積技術(shù)的基本原理和方法，包括蒸發(fā)、濺射、離子束、脈沖激光和等離子體化學(xué)氣相沉積技術(shù)。第六章則討論了薄膜材料的厚度和沉積速率的檢測方法。在*后的第七到第十章中，重點(diǎn)地介紹了當(dāng)前國際上研究的幾種熱點(diǎn)薄膜材料，如低介電常數(shù)薄膜、鐵電薄膜、氧化鋅發(fā)光薄膜和二維材料等的制備方法、結(jié)構(gòu)和性質(zhì)。
薄膜材料與技術(shù)導(dǎo)論 目錄
Chapter 1 Characteristics of Thin Films
1．1 Definition of films
1．2 Surface effect
1．3 Thin film structures and defects
1．4 Basic requirements to make a thin film
Exercises
Chapter 2 Vacuum Technology Foundation
2．1 Basic concepts of vacuum
2．2 Dynamics of gas
2．3 Gas flow and gas extraction
2．4 Vacuum acquisition
2．5 Vacuum measurement
Exercises
Chapter 3 Plasma Technology Basis
3．1 Basic concepts of plasma
3．2 Classification of plasma
3．3 Occurrence of low-temperature plasma
Exercises
Chapter 4 Physical Vapor Deposition of Thin Films
4．1 Evaporation deposition
4．2 Sputtering deposition
4．3 Ion-beam deposition
4．4 Pulsed-laser deposition
4．5 Molecular-beam epitaxy
Exercises
Chapter 5 Chemical-vapor Deposition
5．1 Thermochemical-vapor deposition
5．2 Plasma-enhanced chemical-vapor deposition
5．3 High-density plasma chemical-vapor deposition
5．4 Other chemical-vapor deposition
Exercises
Chapter 6 Kinetics of the Process of Thin Film Growth
6．1 Four steps of thin film growth
6．2 Adsorption
6．3 Surface diffusion
6．4 Nucleation and growth of 2D islands
6．5 Crystallization and film growth
6．6 Growth modes
6．7 Structure development
6．8 Interfaces
Exercises
Chapter 7 Measurement of Film Thickness and Deposition Rate
7．1 Optical method
7．2 Balance method
7．3 Electrical method
7．4 Surface-roughness-meter method
Exercises
Chapter 8 Recent Advances of Thin Film Materials and Technology
8．1 Recent advances in thin film fabrication technologies
8．2 Some important electronic thin film materials
8．3 Progresses of two-dimensional thin film materials
Exercises
References
1．1 Definition of films
1．2 Surface effect
1．3 Thin film structures and defects
1．4 Basic requirements to make a thin film
Exercises
Chapter 2 Vacuum Technology Foundation
2．1 Basic concepts of vacuum
2．2 Dynamics of gas
2．3 Gas flow and gas extraction
2．4 Vacuum acquisition
2．5 Vacuum measurement
Exercises
Chapter 3 Plasma Technology Basis
3．1 Basic concepts of plasma
3．2 Classification of plasma
3．3 Occurrence of low-temperature plasma
Exercises
Chapter 4 Physical Vapor Deposition of Thin Films
4．1 Evaporation deposition
4．2 Sputtering deposition
4．3 Ion-beam deposition
4．4 Pulsed-laser deposition
4．5 Molecular-beam epitaxy
Exercises
Chapter 5 Chemical-vapor Deposition
5．1 Thermochemical-vapor deposition
5．2 Plasma-enhanced chemical-vapor deposition
5．3 High-density plasma chemical-vapor deposition
5．4 Other chemical-vapor deposition
Exercises
Chapter 6 Kinetics of the Process of Thin Film Growth
6．1 Four steps of thin film growth
6．2 Adsorption
6．3 Surface diffusion
6．4 Nucleation and growth of 2D islands
6．5 Crystallization and film growth
6．6 Growth modes
6．7 Structure development
6．8 Interfaces
Exercises
Chapter 7 Measurement of Film Thickness and Deposition Rate
7．1 Optical method
7．2 Balance method
7．3 Electrical method
7．4 Surface-roughness-meter method
Exercises
Chapter 8 Recent Advances of Thin Film Materials and Technology
8．1 Recent advances in thin film fabrication technologies
8．2 Some important electronic thin film materials
8．3 Progresses of two-dimensional thin film materials
Exercises
References
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